photosensitive polyimide|SiO2 hybrid mate materials - Names and Identifiers
| Name | photosensitive polyimide|SiO2 hybrid mate materials
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photosensitive polyimide|SiO2 hybrid mate materials - Physico-chemical Properties
| Physical and Chemical Properties | The PI/SiO2 hybrid material with chemical properties and photosensitive properties has better thermal stability, photosensitive PI material with dimensional stability, mechanical properties and low thermal expansion coefficient. |
| Use | Applications in microelectronics, semiconductor devices. |
photosensitive polyimide|SiO2 hybrid mate materials - Introduction
The new photosensitive polyimide | SiO2 hybrid material is a kind of material which combines photosensitive polyimide with silica hybrid. Its main properties are as follows:
1. Photosensitivity: The material is sensitive to ultraviolet light and can cause chemical or physical changes in substances through light.
2. High temperature resistance: The material has good high temperature resistance and can maintain stability in high temperature environments.
3. Mechanical strength: The introduction of hybrid materials significantly improved the mechanical strength of photosensitive polyimide.
4. Chemical stability: The material has certain chemical stability under the action of common solvents and chemicals.
New photosensitive polyimide | SiO2 hybrid materials are used:
1. Optical devices: Because of its photosensitive properties, it can be used to prepare optical devices such as optical fibers and optical waveguides.
2. Display material: This material can be used to prepare high-resolution display materials and has good high temperature resistance.
3. Microelectronic materials: can be used for the preparation of microelectronic devices, such as semiconductor devices insulating layer materials.
4. Sensor material: Due to its sensitivity to light, it can be used to prepare sensor materials for detecting optical signals.
The method of preparing the material generally includes the following steps:
1. Synthesis of photosensitive polyimide: Synthesis of photosensitive polyimide by polyimide synthesis reaction.
2. Preparation of SiO2 particles: SiO2 particles are usually prepared by a sol-gel method or a precipitation method.
3. Preparation of hybrid materials: the photosensitive polyimide and SiO2 particles are mixed and hybridized into new materials by heat treatment or other methods.
When using the new photosensitive polyimide | SiO2 hybrid material, you need to pay attention to the following safety information:
1. Avoid inhalation: To prevent dust generation, operate under well-ventilated conditions and wear appropriate protective equipment, such as a mask.
2. Avoid contact with skin and eyes: During operation, appropriate protective clothing and glasses should be worn to avoid direct contact with materials.
3. Pay attention to fire prevention: avoid exposing materials to open flames or high temperature environments to avoid fire or explosion.
Last Update：2024-04-09 21:21:28